The MIIS Eprints Archive
Login

Modelling of plasmas used for etching semiconductors

Budd, C.J. and Richardson, G. (2003) Modelling of plasmas used for etching semiconductors. [Study Group Report]

[img]
Preview
 PDF
160kB

Item Type:Study Group Report
Problem Sectors:None/Other
Study Groups:European Study Group with Industry > ESGI 46 (Bristol, UK, Mar 31-Apr 4, 2003)
Company Name:Trikon
ID Code:23
Deposited By: Gordon White
Deposited On:10 Jun 2004
Last Modified:29 May 2015 19:45

Repository Staff Only: item control page

EPrints Logo
The MIIS Eprints Archive is powered by EPrints 3 which is developed by the School of Electronics and Computer Science at the University of Southampton. More information and software credits.